Method and apparatus to correct water drift

Details Method and apparatus to correct water drift Method and apparatus to correct water drift

2006-03-07

2006-03-07

Pert, Evan (Department: 2826)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C414S936000, C250S206100, C356S622000, C702S150000

Reexamination Certificate

active

07008802

ABSTRACT:
A method and apparatus is provided for determining workpiece drift from its nominal or intended position. The apparatus includes two proportionate sensors, each of which gives an output reading that depends upon how much of the sensor beam is blocked by an edge of the workpiece. A computer can calculate positional drift based upon these readings. Also disclosed is a method for aligning proportionate sensors to be parallel to one another.

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