Method and apparatus to correct for stage motion in E-beam...

Details Method and apparatus to correct for stage motion in E-beam... Method and apparatus to correct for stage motion in E-beam...

2005-04-26

2005-04-26

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S311000, C250S307000

Reexamination Certificate

active

06885000

ABSTRACT:
One embodiment disclosed relates to an apparatus for inspecting a substrate. The apparatus includes at least an illumination system, a stage, a multiple-pixel detector, an imaging system, a deflector, and a deflector controller. The illumination system is configured to expose at least a portion of the substrate to an incident beam which causes said portion to emit radiation. The stage holds the substrate and moves the substrate relative to the beam during said exposure of the substrate. The imaging system images the emitted radiation onto the multi-pixel detector, which includes an array of detector elements configured to detect the emitted radiation. The deflector is configured to deflect the emitted radiation under control of the deflector controller. The deflection is controlled so as to compensate for the motion of the substrate relative to the beam.

REFERENCES:
patent: 4877326 (1989-10-01), Chadwick et al.
patent: 4954705 (1990-09-01), Brunner et al.
patent: 5973323 (1999-10-01), Adler et al.
patent: 6038018 (2000-03-01), Yamazaki et al.
patent: 6365897 (2002-04-01), Hamashima et al.
patent: 6677587 (2004-01-01), Kohama
patent: 6686591 (2004-02-01), Ito et al.
patent: 20020148975 (2002-10-01), Kimba et al.

Affiliated with

Also associated with

Rating

Method and apparatus to correct for stage motion in E-beam... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus to correct for stage motion in E-beam..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus to correct for stage motion in E-beam... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3403128