Method and apparatus thereof for burn-in testing of a static...

Static information storage and retrieval – Read/write circuit – Testing

Reexamination Certificate

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Reexamination Certificate

active

06414889

ABSTRACT:

BACKGROUND OF INVENTION
1. Field of the Invention
The present invention relates to a method and an apparatus thereof for testing a memory, more particularly, relates to a method and an apparatus thereof for testing a static random access memory (SRAM) in a burn-in test mode.
2. Description of the Prior Art
To ensure that a normal life failure rate of a static random access memory product meets or exceeds a design goal, a burn-in test is processed after the product is manufactured. In general, the static random access memory product has a plurality of memory cells. The purpose of the burn-in test is to accelerate effects of various failure mechanisms of the memory cells. When the burn-in test is processed, the memory cells of the SRAM are selected by turns and an exterior voltage higher than the supply voltage is applied to each of the selected memory cells to drive the selected memory cells to perform write and read operations repeatedly, thereby checking whether the selected memory cells are in a good state or in a bad state.
Please refer to FIG.
1
.
FIG. 1
is a schematic diagram of an apparatus
10
for testing a static random access memory
20
according to the prior art. The static random access memory
20
comprises a plurality of memory cells
22
for storing data, a plurality of word lines
24
, a plurality of first bit lines
26
, and a plurality of second bit lines
28
. Each of the memory cells
22
is coupled to a corresponding word line
24
, a corresponding first bit line
26
, and a corresponding second bit line
28
. The apparatus
10
comprises a control circuit
12
for controlling operations of the apparatus
10
, a power supply
12
for providing each element of the apparatus
10
withelectric power, a column decoder
16
, and a row decoder
18
. Each of the memory cells
22
is coupled to the power supply
14
. When the apparatus
10
tests the static random access memory
20
, the control circuit
12
controls the column decoder
16
and the row decoder
18
to select an appropriate number of memory cells
22
so as to perform write and read operations sequentially, and the power supply
14
applies a working voltage Vcc of +5V to the selected memory cells
22
until the apparatus
10
accomplishes the test.
Please refer to FIG.
2
.
FIG. 2
is a schematic circuit diagram of the memory cell
22
. The memory cell
22
comprises a storage circuit
32
, a first switch circuit
34
, and a second switch circuit
36
. The storage circuit
32
is coupled to the power supply
14
and is capable of storing at least one binary bit of data. The first switch circuit
34
and the second switch circuit
36
′ are both coupled to the corresponding word line
24
. The first switch circuit
34
is coupled to the corresponding first bit line
26
, and the second switch circuit
36
is coupled to the corresponding second bit line
28
. The memory cell
22
is composed of six metal-oxide-semiconductor field-effect transistors (MOSFETs) T
1
, T
2
, T
3
, T
4
, T
5
, and T
6
. The four transistors T
1
, T
2
, T
5
, and T
6
are NMOS transistors, and the two transistors T
3
, and T
4
are PMOS transistors. The storage circuit
32
is a complementary metal oxide semiconductor (CMOS) circuit composed of the NMOS storage transistors T
1
and T
2
, and the PMOS load transistors T
3
and T
4
. The first switch circuit
34
is composed of the NMOS access transistor T
5
, and the second switch circuit
36
is composed of the NMOS access transistor T
6
.
As mentioned above, when the apparatus
10
tests the static random access memory
20
, the power supply
14
applies the working voltage Vcc of +5V to the selected memory cells until the test is completed. In a write operation of logic “1” data, the control circuit
12
applies a voltage to the word line
24
via the row decoder
18
, thus, the transistors T
5
, and T
6
are rendered conductive. Later, the control circuit
12
applies another voltage to the first bit line
26
via the column decoder
16
, thus, a voltage gap is formed between the first bit line
26
and the second bit line
28
, and node A goes high, so that the transistor T
2
becomes conductive but the transistor T
4
becomes non-conductive. As a result, node B goes low. In response to the voltage level of node B, the transistor T
3
becomes conductive but the transistor T
1
becomes non-conductive. Thus, node A goes high. To the contrary, in the case of logic “0” data write operation, the control circuit
12
also applies a voltage to the word line
24
via the row decoder
18
, so that the transistors T
5
, and T
6
are rendered conductive. Later, the control circuit
12
applies another voltage to the second bit line
28
via the column decoder, thus, another voltage gap is formed between the second bit line
28
and the first bit line
26
, and node B goes high, so that the transistor T
1
becomes conductive, but the transistor T
3
becomes non-conductive. As a result, node A goes low. In response to the voltage level of node A, the transistor T
4
becomes conductive but the transistor T
2
becomes non-conductive, so that node B goes high. Briefly, data is stored as voltage levels with the two sides of the storage circuit
32
in opposite voltage configurations, that is, the node A is high and the node B is low in one state, and the node A is low and the node B is high in the other state. The following method is used to perform this operation:
(a) selecting an appropriate number of memory cells
22
to test, and applying the working voltage Vcc of +5V until the test is accomplished;
(b) applying a voltage to the word lines
24
coupled to the selected memory cells
22
;
(c) forming voltage gaps between the first lines
26
and the second bit lines
28
that are coupled to the selected memory cells
22
so that the storage circuit
32
is able to store corresponding data.
Whenever the control circuit
12
processes the write operation, cell current, which flows from the first bit line
26
or the second bit line
28
to the memory cell
22
, occurs. For instance, in a case of nodes A and B of
FIG. 2
being retained as low and high, respectively (i.e., logic “0” data is stored in the memory cell
22
), when a logic “1” data write operation begins, the transistors T
5
and T
6
are driven conductive. However, since the transistor T
1
still remains conductive during early burn-in write operation, the cell current flows from the first bit line
26
through the transistors T
5
and T
1
to a ground terminal
38
of the memory cell
22
. Moreover, the potential of node B is still higher than the potential of the second bit line
28
during early burn-in write operation, thus another cell current flows from the transistor T
6
to the second bit line
28
. On the contrary, in the case of logic “0” data write operation, the transistor T
2
still remains conductive and the potential of node A is still higher than the potential of the first bit line
26
during early burn-in write operation, thus two cell currents flow from the second bit line
28
through the transistors T
6
and T
2
to another ground terminal
39
of the memory cell
22
and flow from the transistor T
5
to the first bit line
26
, respectively. Since the current load-carrying ability of the bit lines
26
and
28
is limited (i.e., 700 mA per bit line) to avoid burning down the static random access memory, the apparatus
10
must select a limited number of memory cells
22
to test at a time. Therefore, the test time is relatively long.
SUMMARY OF INVENTION
It is therefore an object of the present invention to provide an apparatus and a method thereof for burn-in testing of a static random access memory (SRAM) that has fewer cell current occurrences.
The present invention, briefly summarized, discloses a method and an associated apparatus for burn-in testing of a static random access memory. The static random access memory comprises a plurality of word lines, a plurality of first bit lines, a plurality of second bit lines, and a plurality of memory cells for storing data. Each

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