Method and apparatus of forming alignment film

Details Method and apparatus of forming alignment film Method and apparatus of forming alignment film

2008-05-20

2008-05-20

Fletcher, III, William Phillip (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S551000, C349S123000, C349S124000, C349S125000, C349S126000

Reexamination Certificate

active

07374798

ABSTRACT:
In a method of manufacturing an LCD device, an atomic beam is irradiated onto a thin film including a carbon-carbon double bond to form a polarized functional group by transforming the carbon-carbon double bond into a carbon-carbon single bond and a radical state. Then, a polarity preserving material is combined with the polarized functional group so as to preserve a polarity of the polarized functional group. According to the present invention, the alignment film is formed on the thin film transistor unit cell and on the color filter unit cell by a non-contact method. Therefore, time of forming the alignment film is reduced and alignment of the liquid crystal molecules is improved.

REFERENCES:
patent: 6665033 (2003-12-01), Callegari et al.
patent: 2004/0092617 (2004-05-01), Choo et al.

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