Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-06-22
1990-01-16
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20429815, 20429825, 20429826, 51281SF, 51135R, 414222, C23C 1434, B65H 100
Patent
active
048941336
ABSTRACT:
A sputtering production assembly for producing a magnetic thin-film memory disk and a method of coating the memory disk is provided. The magnetic disk substrates are preliminarily abraded to provide a uniform series of physical circumferential texturing to encourage a circular anisotropic orientation of crystal growth during the subsequent sputtering steps. A nucleating layer is deposited under controlled conditions, and subsequently a thin-film magnetic layer is deposit with a circular anisotropic orientation of crystal growth. Finaly, a thin-film protective coating is disposed on the magnetic layer.
REFERENCES:
patent: 3945903 (1976-03-01), Svendor et al.
patent: 4735840 (1985-11-01), Hedgcoth
patent: 4749465 (1988-06-01), Flint et al.
User's Manual of Tencor Instruments "Alpha-Step 200" pp. 32-35.
Hedgcoth Virgle L.
Nguyen Nam X.
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