Method and apparatus for venting vacuum processing equipment

Details Method and apparatus for venting vacuum processing equipment Method and apparatus for venting vacuum processing equipment

1988-06-06

1989-06-06

Chambers, A. Michael

Fluid handling

Processes

Involving pressure control

137486, 118 50, 437949, F16K 2404

Patent

active

048362336

ABSTRACT:
Controlled, low-turbulence venting of a semiconductor processing vacuum chamber is provided by a venting system including sensing elements for sensing gas conditions, including pressure, in the chamber during venting, and vent rate control elements, including a flow rate regulator valve, responsive to the sensing elements for attaining a venting rate approaching a selected maximal venting rate threshold of sonically choked flow, thereby attaining enhanced non-sonically-choked venting.

REFERENCES:
patent: 3665945 (1972-05-01), Otterstein
patent: 4100310 (1978-07-01), Ura et al.
patent: 4207910 (1980-06-01), Muller
patent: 4739787 (1988-04-01), Stoltenberg

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