Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1988-10-31
1993-04-06
Breneman, R. Bruce
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156610, 156613, 422108, 422245, 118665, 118688, 118691, C30B 2516
Patent
active
052000214
ABSTRACT:
A method for vapor deposition includes monitoring of growth of a semiconductor layer by way of in-situ monitoring. According to the invention, in-situ monitoring is performed by irradiating a light beam onto the surface of the growing layer in a direction nearly perpendicular to the surface. Growth parameters of the layer are detected by monitoring variation of the light reflected by the surface of the layer. A growth condition in a vapor deposition chamber is feedback controlled based on the detected growth parameter.
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Hase Ichiro
Imanaga Syunji
Kaneko Kunio
Kawai Hiroji
Watanabe Naozo
Breneman R. Bruce
Kananen Ronald P.
Sony Corporation
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