Method and apparatus for uniformly spin-coating a photoresist ma

Details Method and apparatus for uniformly spin-coating a photoresist ma Method and apparatus for uniformly spin-coating a photoresist ma

1997-06-30

1999-02-23

Bell, Janyce

Coating processes

Centrifugal force utilized

4273855, 437231, 118 52, B05D 312, B05C 1102

Patent

active

058741283

ABSTRACT:
A method and apparatus for uniformly spin-coating photoresist material on wafers before the wafers are subjected to a photoetching process. The spin-coating apparatus comprises a first rotating device for rotating a rotating connector about a first axis and a second rotating device located on the outer portion of the rotating connector. The second rotating device rotates a wafer about a second axis while the rotating connector rotates around the first axis. The first and second axes are parallel to each other but are spaced apart by a designated distance. The designated distance can be adjusted and a plurality of second rotating devices may be connected to outer portions of the rotating connector.

REFERENCES:
patent: 5264246 (1993-11-01), Ikeno

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