Method and apparatus for uniformly baking substrates such as...

Details Method and apparatus for uniformly baking substrates such as... Method and apparatus for uniformly baking substrates such as...

2005-12-27

2005-12-27

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

C430S270100, C427S532000, C165S080500

Reexamination Certificate

active

06979528

ABSTRACT:
A method and apparatus for baking a film onto a substrate. A film, such as a layer of photoresist, is disposed on a first surface of a substrate while a second surface is exposed to a liquid bath. The liquid bath is maintained at a pre-selected temperature. Exposure of the substrate to the liquid bath allows the film on the opposite surface to bake. The liquid bath is then re-circulated to maintain a constant and uniform temperature gradient across the substrate.

REFERENCES:
patent: 5275237 (1994-01-01), Rolfson et al.
patent: 5716763 (1998-02-01), Benoit et al.
patent: 5983644 (1999-11-01), Bolandi et al.
patent: 6018616 (2000-01-01), Schaper
patent: 6555298 (2003-04-01), Rolfson

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