Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion
Reexamination Certificate
2011-03-29
2011-03-29
Komakov, Michael (Department: 1714)
Cleaning and liquid contact with solids
Apparatus
With movable means to cause fluid motion
C134S157000, C134S902000, C156S345510, C156S345550
Reexamination Certificate
active
07913703
ABSTRACT:
An apparatus used to supply a force onto a cleaning solution for processing a substrate for cleaning surface contaminants is disclosed. The apparatus includes a force applicator and a gate. The force applicator is configured to be adjusted to a first height off the surface of the substrate. The gate is positioned adjacent to a trailing point of the force applicator and is configured to be adjusted to a second height off of the surface of the substrate to enable planarization of the cleaning solution as the solution moves to the trailing point.
REFERENCES:
patent: 3037887 (1962-06-01), Brenner et al.
patent: 3212762 (1965-10-01), Carroll et al.
patent: 3436262 (1969-04-01), Crowe et al.
patent: 3617095 (1971-11-01), Lissant
patent: 3978176 (1976-08-01), Voegeli
patent: 4085059 (1978-04-01), Smith et al.
patent: 4133773 (1979-01-01), Simmons
patent: 4156619 (1979-05-01), Griesshammer
patent: 4238244 (1980-12-01), Banks
patent: 4658842 (1987-04-01), Jensen
patent: 4781764 (1988-11-01), Leenaars
patent: 4817652 (1989-04-01), Liu et al.
patent: 4838289 (1989-06-01), Kottman et al.
patent: 4849027 (1989-07-01), Simmons
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4962776 (1990-10-01), Liu et al.
patent: 5000795 (1991-03-01), Chung et al.
patent: 5048549 (1991-09-01), Hethcoat
patent: 5102777 (1992-04-01), Lin et al.
patent: 5105556 (1992-04-01), Kurokawa et al.
patent: 5113597 (1992-05-01), Sylla
patent: 5175124 (1992-12-01), Winebarger
patent: 5181985 (1993-01-01), Lampert et al.
patent: 5226969 (1993-07-01), Watanabe et al.
patent: 5242669 (1993-09-01), Flor
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5288332 (1994-02-01), Pustilnik et al.
patent: 5306350 (1994-04-01), Hoy et al.
patent: 5336371 (1994-08-01), Chung et al.
patent: 5415191 (1995-05-01), Mashimo et al.
patent: 5417768 (1995-05-01), Smith et al.
patent: 5464480 (1995-11-01), Matthews
patent: 5472502 (1995-12-01), Batchelder
patent: 5494526 (1996-02-01), Paranjpe
patent: 5498293 (1996-03-01), Ilardi et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5660642 (1997-08-01), Britten
patent: 5705223 (1998-01-01), Bunkofske
patent: 5800626 (1998-09-01), Cohen et al.
patent: 5858283 (1999-01-01), Burris
patent: 5900191 (1999-05-01), Gray et al.
patent: 5904156 (1999-05-01), Advocate, Jr. et al.
patent: 5908509 (1999-06-01), Olesen et al.
patent: 5911837 (1999-06-01), Matthews
patent: 5932493 (1999-08-01), Akatsu et al.
patent: 5944581 (1999-08-01), Goenka
patent: 5944582 (1999-08-01), Talieh
patent: 5945351 (1999-08-01), Mathuni
patent: 5951779 (1999-09-01), Koyanagi et al.
patent: 5964954 (1999-10-01), Matsukawa et al.
patent: 5964958 (1999-10-01), Ferrell
patent: 5968285 (1999-10-01), Ferrell et al.
patent: 5997653 (1999-12-01), Yamasaka
patent: 6048409 (2000-04-01), Kanno et al.
patent: 6049996 (2000-04-01), Freeman et al.
patent: 6081650 (2000-06-01), Lyons et al.
patent: 6090217 (2000-07-01), Kittle
patent: 6092538 (2000-07-01), Arai et al.
patent: 6152805 (2000-11-01), Takahashi
patent: 6158445 (2000-12-01), Olesen et al.
patent: 6167583 (2001-01-01), Miyashita et al.
patent: 6197113 (2001-03-01), Zimmer
patent: 6228563 (2001-05-01), Starove et al.
patent: 6267125 (2001-07-01), Bergman et al.
patent: 6270584 (2001-08-01), Ferrell et al.
patent: 6272712 (2001-08-01), Gockel et al.
patent: 6276459 (2001-08-01), Herrick et al.
patent: 6286231 (2001-09-01), Bergman et al.
patent: 6290780 (2001-09-01), Ravkin
patent: 6296715 (2001-10-01), Kittle
patent: 6319801 (2001-11-01), Wake et al.
patent: 6352082 (2002-03-01), Mohindra et al.
patent: 6386956 (2002-05-01), Sato et al.
patent: 6398975 (2002-06-01), Mertens et al.
patent: 6401734 (2002-06-01), Morita et al.
patent: 6423148 (2002-07-01), Aoki
patent: 6439247 (2002-08-01), Kittle
patent: 6457199 (2002-10-01), Frost et al.
patent: 6491043 (2002-12-01), Mohindra et al.
patent: 6491764 (2002-12-01), Mertens et al.
patent: 6493902 (2002-12-01), Lin
patent: 6513538 (2003-02-01), Chung et al.
patent: 6514921 (2003-02-01), Kakizawa et al.
patent: 6527870 (2003-03-01), Gotkis
patent: 6527915 (2003-03-01), Gu
patent: 6532976 (2003-03-01), Huh et al.
patent: 6537915 (2003-03-01), Moore et al.
patent: 6562726 (2003-05-01), Torek et al.
patent: 6576066 (2003-06-01), Namatsu
patent: 6594847 (2003-07-01), Krusell et al.
patent: 6616772 (2003-09-01), de Larios et al.
patent: 6733596 (2004-05-01), Mikhaylichenko et al.
patent: 6787473 (2004-09-01), Andreas
patent: 6797071 (2004-09-01), Kittle
patent: 6846380 (2005-01-01), Dickinson et al.
patent: 6851435 (2005-02-01), Mertens et al.
patent: 6874516 (2005-04-01), Matsuno et al.
patent: 6896826 (2005-05-01), Wojtczak et al.
patent: 6927176 (2005-08-01), Verhaverbeke et al.
patent: 6946396 (2005-09-01), Miyazawa et al.
patent: 6951042 (2005-10-01), Mikhaylichenko et al.
patent: 7122126 (2006-10-01), Fuentes
patent: 7517549 (2009-04-01), Hayashi
patent: 2001/0018320 (2001-08-01), Case et al.
patent: 2002/0072482 (2002-06-01), Sachdev et al.
patent: 2002/0094684 (2002-07-01), Hirasaki et al.
patent: 2002/0121290 (2002-09-01), Tang et al.
patent: 2002/0185164 (2002-12-01), Tetsuka et al.
patent: 2002/0195121 (2002-12-01), Kittle
patent: 2003/0075204 (2003-04-01), de Larios et al.
patent: 2003/0148903 (2003-08-01), Bargaje et al.
patent: 2003/0171239 (2003-09-01), Patel et al.
patent: 2003/0226577 (2003-12-01), Orll et al.
patent: 2004/0002430 (2004-01-01), Verhaverbeke
patent: 2004/0053808 (2004-03-01), Raehse et al.
patent: 2004/0134515 (2004-07-01), Castrucci
patent: 2004/0159335 (2004-08-01), Montierth et al.
patent: 2004/0163681 (2004-08-01), Verhaverbeke
patent: 2004/0261823 (2004-12-01), de Larios
patent: 2005/0045209 (2005-03-01), Tan
patent: 2005/0132515 (2005-06-01), Boyd et al.
patent: 2005/0133060 (2005-06-01), de Larios et al.
patent: 2005/0133061 (2005-06-01), de Larios et al.
patent: 2005/0159322 (2005-07-01), Min et al.
patent: 2005/0176610 (2005-08-01), Konno et al.
patent: 2005/0183740 (2005-08-01), Fulton et al.
patent: 2006/0201267 (2006-09-01), Liu
patent: 2006/0283486 (2006-12-01), de Larios et al.
patent: 2006/0285930 (2006-12-01), de Larios et al.
patent: 2006/2084930 (2006-12-01), Korolik et al.
patent: 2007/0000518 (2007-01-01), de Larios et al.
patent: 40-38-587 (1992-06-01), None
patent: 0827188 (1998-03-01), None
patent: 0905746 (1999-03-01), None
patent: 11-334874 (1999-12-01), None
patent: 0989600 (2000-03-01), None
patent: 53-076559 (1978-07-01), None
patent: 56-084618 (1981-07-01), None
patent: 56-084619 (1981-07-01), None
patent: 59-24849 (1984-02-01), None
patent: 60-005529 (1985-01-01), None
patent: 62-119543 (1987-05-01), None
patent: 63-077510 (1988-04-01), None
patent: 02-309638 (1990-12-01), None
patent: 5-15857 (1993-01-01), None
patent: 06-177101 (1994-06-01), None
patent: 07-006993 (1995-01-01), None
patent: 11-350169 (1999-12-01), None
patent: 2001-064688 (2001-03-01), None
patent: 2002-66475 (2002-03-01), None
patent: 2002-280330 (2002-09-01), None
patent: 2002-309638 (2002-10-01), None
patent: 2003-282513 (2003-10-01), None
patent: 2005-194294 (2005-07-01), None
patent: WO-99/16109 (1999-04-01), None
patent: WO-2000/33980 (2000-06-01), None
patent: WO-00/59006 (2000-10-01), None
patent: WO-01/12384 (2001-02-01), None
patent: WO-02/101795 (2002-12-01), None
patent: WO-2005/006424 (2005-01-01), None
patent: WO 2005/064647 (2005-07-01), None
Kittle, et al. “Removing Particles with a Foam Medium” Internet http://www.aquafoam.com/paper/A2C2foamedium.pdf.
Aubert, JM et al.; “Aqueous foams”; Scientific America; 1986, 74-82, 254.
Kittle, et al.; “Semiconductor Wafer Cleaning and Drying Using a Foam Medium”; <http://www.aquafoam.com/papers;SCI0202.pdf>; Sematech Novel Wafer Cleans Working Group Meeting, Internet Presetation; Nov. 13, 2001.
Hunter; “Introduction to Modern Colloid Science”; Oxford University Press; Feb. 1, 1994.
Lester; “Is Foam Wafer Cleaning and Drying the Future?” <http://www.aquafoam.com/papers/SCI0202.pdf>; Semiconductor International, 25, #2; Feb. 1, 2002.
Kirkpatrick et a
de Larios John M.
Farber Jeffrey J.
Woods Carl
Zhu Ji
Golightly Eric
Komakov Michael
Lam Research Corporation
Martine & Penilla & Gencarella LLP
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