Method and apparatus for treating substrates in a rotary...

Details Method and apparatus for treating substrates in a rotary... Method and apparatus for treating substrates in a rotary...

2005-06-09

2010-10-12

Cleveland, Michael (Department: 1712)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S718000, C118S7230AN, C204S298280, C204S298350, C422S186050

Reexamination Certificate

active

07811384

ABSTRACT:
The invention relates to a method and an apparatus for the treatment of substrates, in particular for the coating of plastic containers on a rotary installation. A plurality of treatment devices are arranged on the rotor and pass through a plurality of process phases as a function of their angle position on the rotor. For at least one process phase, the angle position can be set variably as a function of the current rotational speed of the rotor.

REFERENCES:
patent: 6189481 (2001-02-01), Akimoto
patent: 2006/0099340 (2006-05-01), Behle et al.
patent: 10225607 (2003-12-01), None
patent: 10258681 (2004-02-01), None
patent: WO 03/100120 (2003-12-01), None

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