Method and apparatus for transforming a substrate coordinate sys

Details Method and apparatus for transforming a substrate coordinate sys Method and apparatus for transforming a substrate coordinate sys

1997-08-08

1999-11-16

Picardat, Kevin M.

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

438 12, 438 14, 438 16, 36446828, 356375, H01L 2100

Patent

active

059856807

ABSTRACT:
A method and apparatus for accurately transforming coordinates within a first coordinate system (e.g., a two-dimensional coordinate system associated with a substrate (or portion thereof)) into coordinates in a second coordinate system (e.g., a three-dimensional coordinate system of substrate (or portion thereof) tilted within a wafer analysis tool.

REFERENCES:
patent: 4819167 (1989-04-01), Cheng et al.
patent: 5267017 (1993-11-01), Uritsky et al.
patent: 5381004 (1995-01-01), Uritsky et al.
patent: 5422724 (1995-06-01), Kinney et al.
patent: 5474640 (1995-12-01), Ye et al.
patent: 5497007 (1996-03-01), Uritsky et al.
patent: 5598341 (1997-01-01), Ling et al.
patent: 5628870 (1997-05-01), Ye et al.
patent: 5761064 (1998-06-01), La et al.
patent: 5841661 (1998-12-01), Buchanan et al.
patent: 5870187 (1999-02-01), Uritsky et al.
patent: 5909276 (1999-06-01), Kinney et al.

Affiliated with

Also associated with

Rating

Method and apparatus for transforming a substrate coordinate sys does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for transforming a substrate coordinate sys, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for transforming a substrate coordinate sys will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1323791