Thermal measuring and testing – Distance or angle – Thickness – erosion – or deposition
Reexamination Certificate
2007-04-17
2007-04-17
Verbitsky, Gail (Department: 2859)
Thermal measuring and testing
Distance or angle
Thickness, erosion, or deposition
C374S121000
Reexamination Certificate
active
10672019
ABSTRACT:
A method for measuring a metal film thickness is provided. The method initiates with heating a region of interest of a metal film with a defined amount of heat energy. Then, a temperature of the metal film is measured. Next, a thickness of the metal film is calculated based upon the temperature and the defined amount of heat energy. A chemical mechanical planarization system capable of detecting a thin metal film through the detection of heat transfer dynamics is also provided.
REFERENCES:
patent: 3413474 (1968-11-01), Freeh
patent: 4513384 (1985-04-01), Rosencwaig
patent: 5166080 (1992-11-01), Schietinger et al.
patent: 5258824 (1993-11-01), Carlson et al.
patent: 5377126 (1994-12-01), Flik et al.
patent: 5643050 (1997-07-01), Chen
patent: 5748317 (1998-05-01), Maris et al.
patent: 6000844 (1999-12-01), Cramer et al.
patent: 6069703 (2000-05-01), Banet et al.
patent: 6108091 (2000-08-01), Pecen et al.
patent: 6159073 (2000-12-01), Wiswesser et al.
patent: 6224460 (2001-05-01), Dunton et al.
patent: 6426232 (2002-07-01), Litvak
patent: 6464561 (2002-10-01), Sandhu et al.
patent: 6488568 (2002-12-01), Treur et al.
patent: 6654132 (2003-11-01), Schietinger et al.
patent: 2002/0031164 (2002-03-01), Scheidt et al.
patent: 2003/0008600 (2003-01-01), Ide
patent: 2004/0033761 (2004-02-01), Ono et al.
patent: 2004/0203328 (2004-10-01), Tada et al.
Gotkis Yehiel
Korolik Mikhail
Jagan Mirellys
Lam Research Corporation
Verbitsky Gail
LandOfFree
Method and apparatus for thin metal film thickness measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for thin metal film thickness measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for thin metal film thickness measurement will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3759015