Method and apparatus for the alignment of a substrate

Details Method and apparatus for the alignment of a substrate Method and apparatus for the alignment of a substrate

1995-02-15

1996-02-20

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

054934036

ABSTRACT:
Method comprises a process for obtaining a photoelectric signal with a waveform have a pair of extremal values at respective positions corresponding to a pair of edge portions of an alignment mark by photoelectrically detecting the reflected light from the alignment mark on a substrate; a first determination process for determining the position of the alignment mark on the basis of a pair of slope portions existing inside the pair of extremal values of the photoelectric signal waveform; a second determination process for determining the position of the alignment mark on the basis of a pair of slope portions existing outside the pair of extremal values of the photoelectric signal waveform; a third determination process for determining the position of the alignment mark on the basis of both a pair of slope portions existing inside said pair of extremal values of the photoelectric signal waveform and a pair of slope portions existing outside; and a process for selecting any one of the first determination process, second determination process, or third determination process in accordance with the objective alignment accuracy of the substrate.

REFERENCES:
patent: 4390279 (1983-06-01), Suwa
patent: 4402596 (1983-09-01), Kanatani
patent: 4566795 (1986-01-01), Matsuura et al.
patent: 4655598 (1987-04-01), Murakami et al.
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4679942 (1987-07-01), Suwa et al.
patent: 4702606 (1987-10-01), Matsuura et al.
patent: 4723221 (1988-02-01), Matsuura et al.
patent: 4770533 (1988-09-01), Suwa
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4860374 (1989-08-01), Murakami et al.

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