Method and apparatus for testing sputter targets

Details Method and apparatus for testing sputter targets Method and apparatus for testing sputter targets

1988-12-27

1989-11-07

Williams, Hezron E.

Measuring and testing

With fluid pressure

Leakage

G01M 326

Patent

active

048783765

ABSTRACT:
A test fixture for sputter targets used in the manufacture of semiconductor devices and a method of testing sputter targets. The test fixture comprises a specially shaped piece of material which is adapted to receive a sputter target. The test fixture generally conforms to the shape of the sputter target. The interface between the test fixture and the sputter target is carefully manufactured so as to maintain an airtight seal. A passageway is disposed within one sidewall of the test fixture. A vacuum tubing is disposed within the passageway and valve is connected to the tubing so that the cavity within the test fixture can be evacuated. The size of the cavity is kept small so that it may be quickly evacuated. The present invention provides an efficient and cost effective method of testing sputter targets prior to their being placed in the sputter machine.

REFERENCES:
patent: 1371484 (1921-03-01), Howard
patent: 2403897 (1946-07-01), Aller
patent: 2512134 (1950-06-01), Baule
patent: 3524342 (1970-08-01), Hobbs
patent: 4491509 (1985-01-01), Krause
patent: 4698999 (1987-10-01), Trick et al.

Affiliated with

Also associated with

Rating

Method and apparatus for testing sputter targets does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for testing sputter targets, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for testing sputter targets will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-77143