Radiant energy – Luminophor irradiation – Methods
Patent
1982-05-21
1983-07-12
Smith, Alfred E.
Radiant energy
Luminophor irradiation
Methods
250310, G01N 2322, H01J 3726
Patent
active
043933114
ABSTRACT:
Emission of characteristic electromagnetic radiation in the infrared, visible, or UV from excited particles, typically ions, molecules, or neutral atoms, desorbed from solid surfaces by an incident beam of low-momentum probe radiation has been observed. Disclosed is a method for characterizing solid surfaces based on the observed effect, with low-momentum probe radiation consisting of electrons or photons. Further disclosed is a method for controlling manufacturing processes that is also based on the observed effect. The latter method can, for instance, be advantageously applied in integrated circuit-, integrated optics-, and magnetic bubble device manufacture. Specific examples of applications of the method are registering of masks, control of a direct-writing processing beam, end-point detection in etching, and control of a processing beam for laser- or electron-beam annealing or ion implantation.
REFERENCES:
patent: 2452522 (1948-10-01), Leverenz
patent: 3049618 (1962-08-01), Thome
patent: 3449571 (1969-06-01), Hoerman
patent: 3644044 (1972-02-01), Tolk
patent: 3767925 (1973-10-01), Foley et al.
patent: 3918812 (1975-11-01), Holm
"Bombardment-Induced Light Emission for the Analysis of Surfaces", Thomas et al., ACTA Electronica, 18, 1, 1975, pp. 63-68.
"A Luminescence Spectrophosphorimeter for Measurement of Emissions . . . ", Jameson et al., Journal of Physics E: Scientific Instruments, 1976, vol. 9, pp. 208-212.
"Improved Cathodoluminescence Detection System", De Mets, Journal of Physics E: Scientific Instruments, 1974, vol. 7, p. 971.
Feldman Leonard C.
Kraus Joseph S.
Tolk Norman H.
Traum Morton M.
Tully John C.
Bell Telephone Laboratories Incorporated
Berman Jack I.
Laumann Richard D.
Pacher Eugen E.
Smith Alfred E.
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