Method and apparatus for supplying a source gas

Details Method and apparatus for supplying a source gas Method and apparatus for supplying a source gas

2006-03-07

2006-03-07

Chiesa, Richard L. (Department: 1724)

Gas and liquid contact apparatus

Contact devices

Liquid tank

C261S128000, C261S142000, C261SDIG065, C438S680000

Reexamination Certificate

active

07007933

ABSTRACT:
A method for supplying a source gas to a processing chamber for forming a film on a substrate in the processing chamber includes: heating a carrier gas; bubbling the heated carrier gas in a liquid source disposed in a container to form a vapor source; and supplying a source gas including the vapor source and the heated carrier gas into the processing chamber for forming the film.

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Notice of Office Action, Korean Application No. 10-2002-0052021, Jul. 30, 2004.

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