Method and apparatus for sputtering superconducting thin films o

Details Method and apparatus for sputtering superconducting thin films o Method and apparatus for sputtering superconducting thin films o

1992-08-14

1994-04-26

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429802, 20429806, 20429812, 20429821, 505816, 505866, H01L 3924, C23C 1434

Patent

active

053064062

ABSTRACT:
A method of providing a thin film for lining quarter-wave resonant cavities of copper comprises the deposition of a superconducting material, in particular niobium, in the form of a micro-layer having a substantially constant thickness covering both the cylindrical surface of the cavity and its bottom formed of a plane plate, by biased-diode d.c. sputtering through emitting cathodes in a form fitting geometrically the surfaces to be lined.

REFERENCES:
S. A. Wolf et al., J. Vac. Sci. Technol., vol. 13, No. 1, Jan./Feb. 1976, pp. 145-147.

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