Method and apparatus for sputtering a dielectric target or for r

Details Method and apparatus for sputtering a dielectric target or for r Method and apparatus for sputtering a dielectric target or for r

1986-02-14

1987-09-15

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

204298, C23C 1434

Patent

active

046938052

ABSTRACT:
A device and method for sputtering dielectric targets, for reactive sputtering, and for sputter etching, including a target, anode and auxiliary electrode where each of the foregoing elements is electrically isolated from a grounded chamber containing a plasma and during a sputtering cycle, the anode and target are connected across a first floating power supply which applies a first series of waveforms to the target to render the target positive with respect to the plasma and thus sputter it and during a charge removal cycle, the auxiliary electrode and target are connected across a second floating power supply which applies to the target a second series of waveforms during respective intervals between the first series of waveforms to render the target negative with respect to the plasma and thus remove any positive charge build up which may have occurred during the sputtering cycle.

REFERENCES:
patent: 3464907 (1969-09-01), Froemel et al.
patent: 3525680 (1970-08-01), Davidse et al.
patent: 3594295 (1971-07-01), Meckel et al.
patent: 3617459 (1971-11-01), Logan
patent: 3763031 (1973-10-01), Scow et al.
patent: 4021277 (1977-05-01), Shirn et al.
patent: 4046659 (1977-09-01), Cormia et al.
patent: 4131533 (1978-12-01), Bialks et al.
patent: 4464223 (1984-08-01), Gorin
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4585516 (1986-04-01), Corn et al.

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