Method and apparatus for solving mask precipitated defect issue

Details Method and apparatus for solving mask precipitated defect issue Method and apparatus for solving mask precipitated defect issue

2006-04-28

2010-02-02

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S322000, C134S001000, C134S034000, C359S266000, C359S296000

Reexamination Certificate

active

07655363

ABSTRACT:
Disclosed are a method and an apparatus for solving mask precipitated defect issue. A gas is purged into a photomask reticle assembly for diffusing precipitated defects out of a photomask in the photomask reticle assembly. A metal shielding assembly enclosing the photomask reticle assembly is provided for reducing precipitated defects and damages to the photomask. In an illustrative embodiment, the metal shielding assembly comprises an upper metal shielding, a pellicle frame of the photomask reticle assembly, side support frames of the photomask reticle assembly, a top cover, a handle, and a handle cover.

REFERENCES:
patent: 6247599 (2001-06-01), Cheng et al.
patent: 6421113 (2002-07-01), Armentrout
patent: 2003/0207182 (2003-11-01), Shirasaki
patent: 2005/0191563 (2005-09-01), Dai et al.

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