Radiant energy – Photocells; circuits and apparatus – With circuit for evaluating a web – strand – strip – or sheet
Patent
1998-03-25
2000-04-18
Le, Que T.
Radiant energy
Photocells; circuits and apparatus
With circuit for evaluating a web, strand, strip, or sheet
25055944, G01N 2186
Patent
active
060518456
ABSTRACT:
A method and apparatus that accurately marks a wafer at selected locations to form a wafer coordinate system. The apparatus contains a wafer platen for retaining a wafer in a substantially horizontal orientation, a wafer orientation detector assembly and a marking assembly mounted above the wafer platen. In operation, the apparatus orients the wafer by identifying an orientation attribute of the wafer, then applies fiducial marks to the wafer. The wafer marking apparatus forms a portion of an integrated analytical tool.
REFERENCES:
patent: 4568879 (1986-02-01), Nakamura et al.
patent: 4585931 (1986-04-01), Duncan et al.
patent: 5267017 (1993-11-01), Uritsky et al.
patent: 5381004 (1995-01-01), Uritsky et al.
patent: 5479252 (1995-12-01), Worset et al.
patent: 5497007 (1996-03-01), Uritsky et al.
patent: 5563520 (1996-10-01), Terada
patent: 5877064 (1999-03-01), Chang et al.
Man-Ping Cai, Yuri Uritsky, Patrick Kinney, "Optimization of Wafer Surface Particle Position Map Prior to Viewing with an Electron Microscope", American Institute of Physics, pp. 243-247, 1996. (Month Unknown).
Applied Materials Inc.
Le Que T.
LandOfFree
Method and apparatus for selectively marking a semiconductor waf does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for selectively marking a semiconductor waf, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for selectively marking a semiconductor waf will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2337890