Method and apparatus for selective spectroscopic analysis of a w

Details Method and apparatus for selective spectroscopic analysis of a w Method and apparatus for selective spectroscopic analysis of a w

1997-10-07

1999-05-11

Kim, Robert

Optics: measuring and testing

By particle light scattering

With photocell detection

356359, G01B9/02

Patent

active

059033517

ABSTRACT:
A spectroscopic analyzing method and apparatus for a wafer surface and gas phase elements in a reaction chamber. A beam of radiant energy is introduced from a light incident apparatus to the reaction chamber through a window on a wall of the reaction chamber at a predetermined, but variable, angle of incidence. The angle of incidence is set by adjusting optical elements in the light incident apparatus and an angle of the window. At one angle of incidence, the beam of radiant energy is caused to interact with gas-phase elements in the reaction chamber for spectroscopic analysis. At another angle of incidence, the beam of radiant energy is caused to interact with the wafer surface for spectroscopic analysis.

REFERENCES:
patent: 3850526 (1974-11-01), Corey, III
patent: 4302108 (1981-11-01), Timson
patent: 5563707 (1996-10-01), Prass et al.
Barbara J. Barner et al. "Polarization Modulation Fourier Transform Infrared Reflectance Measurements of Thin Films and Monolayers at Metal Surfaces Utilizing Real-Time Sampling Electronics,"; Anal. Chem. 1991, vol. 63, p. 55.
T.A. Cleland et al. "Detection of dry etching product species with in situ Fourier transform infrared spectroscopy,".

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