Method and apparatus for scheduling metrology based on a...

Details Method and apparatus for scheduling metrology based on a... Method and apparatus for scheduling metrology based on a...

2007-11-20

2007-11-20

Cabrera, Zoila (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S108000, C702S183000

Reexamination Certificate

active

11109298

ABSTRACT:
The present invention provides a method that includes determining a jeopardy count associated with at least one processing tool and selecting at least one wafer based upon the jeopardy count, the at least one wafer having been processed by the at least one processing tool.

REFERENCES:
patent: 6577972 (2003-06-01), Yanaru et al.
patent: 6684124 (2004-01-01), Schedel et al.
patent: 7016750 (2006-03-01), Steinkirchner et al.
patent: 7089075 (2006-08-01), Hasan
patent: 2006/0195215 (2006-08-01), Suzuki et al.

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