Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-11-30
2009-10-27
Vanore, David A (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100, C250S492210, C250S492300, C250S453110, C250S442110
Reexamination Certificate
active
07608843
ABSTRACT:
A method and apparatus300for better controlling scanning of a workpiece330through an ion beam path306provide for mounting a workpiece330on an elongated member, partially repetitively rotating the elongated member500around a point of rotation368to make repetitive scans of the workpiece330along and arcuate path504and bending the elongated member500at a joint322to move the one and out of the ion beam path306to facilitate attachment and removal of individual workpieces330.A motor315used for the rotating may be suspended within a partial vacuum enclosure304against gravity for raising and lowering the elongated member and500a workpiece306for linear vertical scanning.
REFERENCES:
patent: 4733091 (1988-03-01), Robinson et al.
patent: 4965862 (1990-10-01), Freytsis et al.
patent: 5003183 (1991-03-01), Nogami et al.
patent: 5789890 (1998-08-01), Genov et al.
patent: 5814194 (1998-09-01), Deguchi et al.
patent: 6241462 (2001-06-01), Wannasuphoprasit et al.
patent: 6486478 (2002-11-01), Libby et al.
patent: 6494666 (2002-12-01), Wu et al.
patent: 6646277 (2003-11-01), Mack et al.
patent: 7067828 (2006-06-01), Swenson
patent: 7105838 (2006-09-01), Naylor-Smith et al.
patent: 7119343 (2006-10-01), Asdigha et al.
patent: 7326941 (2008-02-01), Chen et al.
patent: 2002/0134950 (2002-09-01), Vanderpot et al.
patent: 2003/0094583 (2003-05-01), Jang et al.
patent: 2004/0222390 (2004-11-01), Ferrara et al.
patent: 2005/0173656 (2005-08-01), Kaim et al.
patent: 2005/0184253 (2005-08-01), Ioannou et al.
patent: 2005/0230643 (2005-10-01), Vanderpot et al.
patent: 2005/0232748 (2005-10-01), Vanderpot et al.
patent: 2005/0232749 (2005-10-01), Vanderpot et al.
PCTUS0661424, publication date: Apr. 10, 2008, Written Opinion.
Freytsis Avrum
Gwinn Matthew C.
Harrington Eric R.
Burns & Levinson LLP
Cohen Jerry
Gomes David
Maskell Michael
TEL Epion Inc.
LandOfFree
Method and apparatus for scanning a workpiece through an ion... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for scanning a workpiece through an ion..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for scanning a workpiece through an ion... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4133338