Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2005-04-12
2005-04-12
Niebling, John F. (Department: 2812)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
Reexamination Certificate
active
06879870
ABSTRACT:
A method and apparatus for routing harmonic energy within a plasma to ground in a plasma enhanced semiconductor wafer processing reactor. A model of the chamber is used to determine the pathway for RF power and the harmonic energy of that RF power through the chamber. From this model, the placement and design of a harmonic routing circuit is determined to shunt the harmonic energy to ground.
REFERENCES:
patent: 6535785 (2003-03-01), Johnson et al.
patent: 6537421 (2003-03-01), Drewery
patent: 1 193 746 (2002-04-01), None
patent: WO 0171765 (2001-09-01), None
PCT Search Report dated Jan. 2, 2004 for Application No. PCT/US03/11781.
Barnes Michael
Hoffman Daniel J.
LaBlanc Lee
Shannon Steven C.
Bach Joseph
Moser Patterson Sheridan LLC
Niebling John F.
Stevenson André C.
LandOfFree
Method and apparatus for routing harmonics in a plasma to... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for routing harmonics in a plasma to..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for routing harmonics in a plasma to... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3401278