Method and apparatus for removing vapor from a pressurized spray

Details Method and apparatus for removing vapor from a pressurized spray Method and apparatus for removing vapor from a pressurized spray

1992-05-06

1994-01-18

Foelak, Morton

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430331, 430327, 134 33, 1341042, 1341041, 134902, 427273, 427240, G03C 500

Patent

active

052799263

ABSTRACT:
Pressurized liquid solvent is dispensed on specific areas of a semiconductor wafer. A vented accumulator removes bubbles introduced by an upstream needle valve. The accumulator outlet leads directly to a dispensing tip, without further pressure drop.

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patent: 4886728 (1989-12-01), Salamy et al.
patent: 5001084 (1991-03-01), Kawai et al.

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