Method and apparatus for removing polymer residue from...

Details Method and apparatus for removing polymer residue from... Method and apparatus for removing polymer residue from...

2007-09-11

2007-09-11

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S033000

Reexamination Certificate

active

10420228

ABSTRACT:
A method for cleaning a semiconductor device has the steps of securing a wafer (16) with a modified chuck (11) and applying a cleaning solution (18) to the backside (20) of the wafer (16). The cleaning solution (18) is formulated to remove PTFE from the wafer (16). The cleaning solution (18) is applied to the edge (14) of the wafer (16) because of the characteristics of the modified chuck (11) to remove PTFE impurities that gather on the edge (14) of the wafer (16).

REFERENCES:
patent: 4603867 (1986-08-01), Babb et al.
patent: 4999320 (1991-03-01), Douglas
patent: 5762708 (1998-06-01), Motoda et al.
patent: 5763375 (1998-06-01), Kezuka et al.
patent: 6132522 (2000-10-01), Verhaverbeke et al.
patent: 6149828 (2000-11-01), Vaartstra
patent: 6179978 (2001-01-01), Hirsh et al.
patent: 6230609 (2001-05-01), Bender et al.
patent: 6370972 (2002-04-01), Bomber et al.
patent: 6435200 (2002-08-01), Langen
patent: 6517697 (2003-02-01), Yamagata
patent: 6594847 (2003-07-01), Krusell et al.
patent: 6799589 (2004-10-01), Inagaki
patent: 2002/0035762 (2002-03-01), Okuda et al.
patent: 2002/0066717 (2002-06-01), Verhaverbeke et al.
patent: 2003/0093917 (2003-05-01), DiBello
patent: 2003/0113478 (2003-06-01), Dang et al.

Affiliated with

Also associated with

Rating

Method and apparatus for removing polymer residue from... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for removing polymer residue from..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for removing polymer residue from... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3720934