Metal working – Barrier layer or semiconductor device making
Patent
1994-12-15
1999-10-26
Graybill, David
Metal working
Barrier layer or semiconductor device making
15 151, 134 13, 438906, H01L 2130
Patent
active
059720514
ABSTRACT:
Discloses is an apparatus and method for cleaning the edges of semiconductor wafers by using a particle withdrawing means having pre-formed, low-tack adhesive material that removes the particles from the edges of the wafers and retains the particles thus removed.
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Leroux Pierre
Schmidt Bryan D.
Graybill David
VLSI Technology, Inc
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