Method and apparatus for removing contaminants from substrate

Details Method and apparatus for removing contaminants from substrate Method and apparatus for removing contaminants from substrate

2011-06-28

2011-06-28

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S026000

Reexamination Certificate

active

07967019

ABSTRACT:
A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled velocity to effect removal of the cleaning material and contaminants entrapped within the cleaning material from the surface of the substrate. The controlled velocity of the rinsing fluid is set to cause the cleaning material to behave in an elastic manner when impacted by the rinsing fluid, thereby improving contaminant removal from the surface of the substrate.

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patent: 10-0766343 (2007-10-01), None

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