Method and apparatus for regulating a degree of reaction in a co

Details Method and apparatus for regulating a degree of reaction in a co Method and apparatus for regulating a degree of reaction in a co

1993-08-25

1995-05-09

Kunemund, Robert

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429803, 20429807, 20429811, 20429815, 20429826, 20429808, 20419238, 20429841, C23C 1454

Patent

active

054136849

ABSTRACT:
A method and apparatus for controlling a ratio .gamma.=x/y, for the coating of a work piece with a layer F.sub.x G.sub.y, using plasma-enhanced reactive deposition processes, includes changing the rate at which a solid material is vaporized and also controlling the atmosphere within the vacuum chamber of the apparatus.

REFERENCES:
patent: 4526802 (1985-07-01), Sato
patent: 4992153 (1991-02-01), Bergmann et al.
patent: 5292417 (1994-03-01), Kugler

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