Method and apparatus for reducing imager floating diffusion...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S222000, C257S225000, C257S291000, C257S443000, C257S461000, C257S290000, C438S048000, C438S066000, C438S067000, C438S073000, C438S080000

Reexamination Certificate

active

07071505

ABSTRACT:
An imager having reduced floating diffusion leakage and a mechanism for improving the storing of collected charge is described. A polysilicon contact is provided between a floating diffusion region and a gate of a source follower output transistor, with the contact also electrically connected to a storage capacitor. The storage capacitor provides additional charge storage capacity to the floating diffusion region. In addition, an associated reset transistor has different dopant characteristics in the source and drain regions. The floating diffusion region may be used in the pixels of a CMOS imager or in the output stage of a CCD imager.

REFERENCES:
patent: 6140630 (2000-10-01), Rhodes
patent: 6204524 (2001-03-01), Rhodes
patent: 6310366 (2001-10-01), Rhodes et al.
patent: 6326652 (2001-12-01), Rhodes
patent: 6333205 (2001-12-01), Rhodes
patent: 6376868 (2002-04-01), Rhodes
patent: 2004/0099886 (2004-05-01), Rhodes et al.

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