Method and apparatus for reducing build-up of material on inner

Details Method and apparatus for reducing build-up of material on inner Method and apparatus for reducing build-up of material on inner

1997-01-13

1998-10-27

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

138104, 138114, 4272481, C23C 1600, F16L 5500, F16L 918

Patent

active

058273700

ABSTRACT:
An apparatus for preventing the deposition and build-up of chains of polymerized TEOS molecules in the pipes downstream from a reaction furnace in a semiconductor manufacturing process includes an annular nozzle assembly positioned inside the pipes such that a plenum is formed between the annular nozzle assembly and the pipes and such that the annular nozzle forms a hollow tubular conduit for conducting effluent from the reaction furnace. The annular nozzle assembly preferably includes three hollow and generally cylindrical sections, an upstream collar, a downstream spacer ring, and a middle section(s) positioned between the upstream collar and the downstream spacer ring. The annular nozzle assembly is placed within the pipes downstream of the reaction furnace during operation and is modularly constructed so that the length of the annular nozzle assembly can be varied, depending on the length of the downstream pipes from the reaction furnace. The annular nozzle assembly forms a gas boundary layer or moving virtual wall on its inner surfaces that prevents TEOS gas molecules and water vapor molecules from absorbing or residing on the inner surfaces of the annular nozzle assembly, thus preventing surface chemical reactions between TEOS gas molecules and water vapor molecules on the inner surfaces of the annular nozzle assembly, thereby preventing the deposition and build-up of chains of polymerized TEOS molecules on the inner surfaces of the annular nozzle assembly or the inner surfaces of the pipes in which the annular nozzle assembly is placed.

REFERENCES:
patent: 4911102 (1990-03-01), Manabe et al.
patent: 5160543 (1992-11-01), Ishihara et al.
patent: 5722802 (1998-03-01), March
Brodsky et al, Method of Preparing Hydrogenated Amorphous Silicon, IBM Technical Disclosure Bulletin vol. 22. No. 8A pp. 3391-3392, Jan. 1980.
Dusinberre, Gas Turbine Power, p. 158, 1952.
Giampaolo, The Gas Turbine handbook: Principles and Practices, pp. 35-39, 1997.

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