Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2008-01-01
2008-01-01
Berman, Jack (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C355S030000, C355S055000, C355S071000, C355S077000, C396S604000, C396S611000, C356S239200, C356S401000, C430S311000, C430S322000, C430S323000
Reexamination Certificate
active
07315033
ABSTRACT:
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting element and/or an irradiating element is used to direct radiation to kill biological contaminates present with respect to at least one of i) a volume adjacent a final element of the projection system or ii) an immersion medium supply device disposed adjacent the final element.
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Kye Jong-wook
Levinson Harry J.
Pawloski Adam R.
Advanced Micro Devices , Inc.
Berman Jack
Renner , Otto, Boisselle & Sklar, LLP
Sahu Meenakshi S
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