Method and apparatus for production and use of nanometer scale l

Details Method and apparatus for production and use of nanometer scale l Method and apparatus for production and use of nanometer scale l

1985-08-12

1987-04-21

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156652, 156655, 1566591, 355 78, 427 431, 430 5, 430311, B44C 122, C03C 1500, G03B 2702, G03F 900

Patent

active

046594299

ABSTRACT:
An optical system for determining and reproducing spatial separation of features in the range of 80 .ANG. to 2500 .ANG. for optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light.
An aperture mask is provided having at least one aperture of between about 80 .ANG. and 2500 .ANG. diameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.

REFERENCES:
patent: 3155505 (1964-11-01), Shannon
patent: 3607680 (1968-09-01), Uno et al.
patent: 3668028 (1972-06-01), Short
patent: 3782823 (1974-01-01), Kantorski et al.
patent: 3852134 (1974-12-01), Bean
patent: 4030827 (1977-06-01), Delhaye et al.
patent: 4100416 (1978-07-01), Hirschfeld
patent: 4155801 (1979-05-01), Provancher
patent: 4182010 (1980-01-01), Lemmond
patent: 4195930 (1980-04-01), Delhaye et al.
patent: 4262186 (1981-04-01), Provancher
patent: 4269653 (1981-05-01), Wada et al.
patent: 4331505 (1982-05-01), Hirt
Abstract Lewis et al., "Scanning Optical Spectral Microscopy with 500 .ANG. Spatial Resolution", Biophysical Journal, vol. 41, No. 2, Part 2, Feb. 1983.
P. A. Ash and G. Nichols, "Super-Resolution Aperture Scanning Microscope", pp. 510-512, Nature, vol. 237, Jun. 30, 1972.
Moharir, P. S., "Two-Dimensional Encoding Masks for Hadamard Spectrometric Imager," ms. recd. 17 Aug. 1973 for IEEE Transactions on Electromagnetic Compatibility, V EMC 16, No. 2, May 1974, pp. 126-129.

Affiliated with

Also associated with

Rating

Method and apparatus for production and use of nanometer scale l does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for production and use of nanometer scale l, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for production and use of nanometer scale l will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-749845