Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1985-11-26
1988-03-22
Boudreau, Leo H.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511171, 315 4, 315 39, 31323131, 313161, 376123, H01J 1726, H05B 3126
Patent
active
047331330
ABSTRACT:
A method and apparatus are disclosed for producing microwave radiation wherein a generally stable, high-beta, relativistic electron plasma is formed and magnetically confined in a magnetic mirror region of a suitable enclosure, a convectively unstable wave then being created in the confined plasma for producing a pulse of relatively intense microwave radiation at a frequency near a local electron gyrofrequency of the plasma, the plasma preferably being formed by simultaneous multiple-frequency electron cyclotron heating and upper off-resonant heating using microwave power at frequencies above the electron gyrofrequency of the plasma. The above steps or functions are preferably sequentially repeated with sequential pulses of microwave radiation being withdrawn from the enclosure, focused by quasi-optical means and directed toward a target including electronic circuitry, the method and apparatus of the invention being preferably adapted for causing the beam of sequential pulses to be coupled into the electronic circuitry for developing substantial amounts of energy therein.
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patent: 4500843 (1985-02-01), Szoke et al.
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patent: 4548782 (1985-10-01), Manheimer et al.
patent: 4559475 (1985-12-01), Manheimer et al.
patent: 4604551 (1986-08-01), Noeller
"Cyclotron Resonance Maser with Background Plasma", Sov. Phys. JETP 53(), Jun. 1981, pp. 1146-1152.
Applied Microwave Plasma Concepts, Inc.
Boudreau Leo H.
Hill Robert Charles
Powell Mark R.
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