Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-08-23
1997-01-21
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118 47, 118 501, 118620, 118718, 118723MW, 118723VE, 427129, 427130, 427131, 427132, 427249, 4272555, 427294, 427404, 4274071, 4274192, 427575, 427577, H05H 102
Patent
active
055957927
ABSTRACT:
A method and apparatus for producing a magnetic recording medium in which production of flakes in a film-forming process and the occurrence of arc discharge in the film-forming surface of a substrate are prevented to thereby attain improvement in the quality of the resulting film and in producing efficiency. A web-like substrate is made to run in a vacuum chamber while the substrate is arranged opposite to a sheet-shaped plasma stream. At the same time, a reactive gas is supplied to the plasma stream while an electric field is generated in a direction crossing the plasma stream and the substrate, which are arranged opposite to each other to thereby form a thin film on the plasma stream side surface of the substrate. Accordingly, the production of flakes is prevented, so that the occurrence of arc discharge in the film-forming surface of the substrate is prevented.
Kashiwaya Makoto
Nakada Junji
Fuji Photo Film Co. , Ltd.
Pianalto Bernard
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