Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1992-03-26
1993-07-06
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511121, 31323131, 20429837, H05H 118
Patent
active
052257401
ABSTRACT:
High density plasma is produced in a long cylindrical cavity by the excitation of a high frequency whistler wave within the cavity. The cylindrical cavity, and hence the plasma, is imbedded in a high magnetic field, with magnetic lines of force passing axially (longitudinally) through the cavity. The magnetic field has an electron cyclotron frequency associated therewith that is much greater than the wave frequency associated with the whistler wave. In one embodiment, electromagnetic energy is coupled axially into the cylindrical cavity using a resonant cavity, which coupled energy excites the whistler wave. In another embodiment, electromagnetic energy is coupled radially into the cylindrical cavity using a slow wave structure. The plasma is created without using electrodes; and the excitation of the whistler wave is achieved at a high Q value. Various configurations are used to couple between the resonant cavity or circuit and the plasma, thereby allowing the invention to be used for numerous applications, such as plasma processing, e.g., plasma etching, stripping or deposition; or the excitation of high power lasers; ion sources; or sputtering guns.
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General Atomics
LaRoche Eugene R.
Yoo Do Hyun
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