Method and apparatus for producing diamond thin films

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427569, 423446, B05D 306, B01J 306

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active

052582060

ABSTRACT:
The present invention concerns a method of producing a diamond thin film. A plasma-activated gas, obtained by exciting a starting material containing a carbon source gas, is brought into contact with a surface of a substrate, on which a diamond thin film is to be formed under the presence of an auxiliary member placed adjacent to a protruded portion present at the surface of the substrate. The diamond thin film is thereby formed on the substrate. An apparatus for producing a diamond thin film by means of a microwave plasma method has an auxiliary member placed adjacent to a protruded portion present at the surface of the substrate on which the diamond thin film is to be formed.

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"Diamond Thin Films", Chem. & Eng. News, May 15, 1989, pp. 32-33.
Singh et al. Applied Physics Letters, vol. 52, No. 6, pp. 451-452, Feb. 8, 1988.
Pellicori et al. Journal of Vacuum Science & Technology/Part A, vol. 4, No. 5, 2nd series, pp. 2350-2355, Sep.-Oct. 1986.
Journal of Crystal Growth, vol. 93, Nos. 1-4, pp. 228-234, Nov.-Dec. 1988 Wang et al.

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