Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-04-12
2005-04-12
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192160, C204S192260
Reexamination Certificate
active
06878243
ABSTRACT:
A method and apparatus for producing an optically effective system of layers on a substrate, such as a lens for use in an optical device. A plasma supported sputter deposition process is employed which, for the purpose of reducing damage to the rear side (1b) first applies a protective layer (2) to the rear side and then applies a system of layers (3) on the front side (1a) of the substrate (1). The apparatus includes an evacuable sputter chamber and a substrate holder (5) with receiving elements (6) for the substrates, and the receiving elements are mounted to permit rotation about two mutually perpendicular axes.
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patent: 6090247 (2000-07-01), White et al.
patent: 6143143 (2000-11-01), Walls et al.
patent: 41 17 257 (1992-12-01), None
M. Ruske et al.,Properties of SiO2and Si3N4layers deposited by MF twin magnetron sputtering using different target materials, Thin Solid Films 351 (1999) pp. 158-163.
H. K. Pulker,Coating on Glass, 2d Edition, Title page and pp. 441-443, Elsevier, Amsterdam, 1999.
Alston & Bird LLP
Satis Vacuum Industries Vertriebs AG
Versteeg Steven
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