Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-01-25
1998-01-27
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041923, 20419232, 20419235, 20419215, 20419234, C23C 1434
Patent
active
057118604
ABSTRACT:
The present invention is directed to a method and apparatus for producing a highly-textured surface on a copper substrate with only extremely small amounts of texture-inducing seeding or masking material. The texture-inducing seeding material is delivered to the copper substrate electrically switching the seeding material in and out of a circuit loop.
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"An Effective Secondary Electron Emission Suppression Treatment for Copper MDC Electrodes "Curren et al., International Electron Devices Meeting, Washington, DC., Dec. 5-8, 1993 pp. 31.8.1-31.8.3.
International Electron Devices Meeting Washington, DC, Dec. 5-8, 1993.
Curren Arthur N.
Jensen Kenneth A.
Roman Robert F.
Breneman R. Bruce
McDonald Rodney G.
Reinecke Susan
Stone Kent N.
The United States of America as represented by the Administrator
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