Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent
1995-06-06
2000-06-20
Utech, Benjamin L.
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
438710, 156345, H01L 21302, C23F 102
Patent
active
060777885
ABSTRACT:
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus, the samples being selectively etched through use of a resist mask), (b) for removing (ashing) the resist mask, (c) for wet-processing of the samples and (d) for dry-processing the samples. Samples are passed sequentially from a supply cassette (containing a plurality of samples) to the plasma etching apparatus, through the other apparatus and to a discharge cassette (which can hold a plurality of the samples). At least two of the samples can be processed simultaneously in a path from (and including), the plasma etching apparatus to (and including) the wet-processing structure.
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Fukuyama Ryooji
Kawahara Hironobu
Kawasaki Yoshinao
Nojiri Kazuo
Sato Yoshiaki
Deo Duy-Vu
Hitachi , Ltd.
Utech Benjamin L.
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