Method and apparatus for preventing the formation of a...

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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C118S7230IR, C118S7230ER, C118S7230ER, C156S345350, C156S345430, C156S345440, C156S345450, C156S345460, C156S345470, C156S345480, C315S111210, C315S111410, C315S111510, C315S111710

Reexamination Certificate

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07942112

ABSTRACT:
A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a wall that defines a plasma formation region where a chemically-reducing species is formed from a fluid. A portion of the wall is formed of a substance that is substantially inert to the chemically-reducing species. The wall prevents the chemically-reducing species from interacting with an inner surface of the plasma chamber to form a conductive substance. The barrier component also includes an opening in fluid communication with the plasma formation region. The fluid is introduced into the plasma formation region via the opening.

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