Method and apparatus for preventing distortion of horizontal qua

Details Method and apparatus for preventing distortion of horizontal qua Method and apparatus for preventing distortion of horizontal qua

1995-10-13

1996-12-17

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118715, 219390, 432 4, 432 37, 432 95, 432253, C23C 1600

Patent

active

055849342

ABSTRACT:
The present invention relates to an improved equipment in semiconductor processing. The invention includes a horizontal quartz tube surrounded with heating element for processing wafers, an inlet pipe of a gas injector mounted at the center of the closed end of a horizontal quartz tube, four sheath supports each being 90 degrees apart located at the closed end of a horizontal quartz tube for supporting a thermocouple sheath. The horizontal quartz tube is rotated 90 degrees every 14 to 15 days in a predetermined direction. As the horizontal quartz tube is rotated, the thermocouple sheath is always inserted into the sheath support located at the bottom of the horizontal quartz tube.

REFERENCES:
patent: 4421942 (1983-12-01), Crichton
patent: 4711989 (1987-12-01), Yu
patent: 4854266 (1989-08-01), Simson
patent: 5029554 (1991-07-01), Miyashita
patent: 5118286 (1992-06-01), Sarin
patent: 5254172 (1993-10-01), Otaki

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