Fluid handling – Processes – Involving pressure control
Patent
1996-03-29
1998-06-02
Ferensic, Denise L.
Fluid handling
Processes
Involving pressure control
1374875, 137114, 437 7, 216 59, 156345, 118710, 118692, F17D 116, F17D 118, F16K 1734
Patent
active
057586802
ABSTRACT:
A method and apparatus is disclosed for controlling the pressure of reaction chamber in wafer processing equipment. The disclosed apparatus and method uses a ballast port for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve which is located between the reaction chamber and turbo pump. The disclosed apparatus and method further introduces process gases at higher rate than set point levels to reduce the transition time or stabilization time required when raising the pressure in the reaction chamber.
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Barnes Michael S.
Kaveh Farro Frank
Olson Christopher H.
Richardson Brett C.
Ferensic Denise L.
Kim Joanne Y.
Lam Research Corporation
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