Method and apparatus for preparing a sample for optical analysis

Details Method and apparatus for preparing a sample for optical analysis Method and apparatus for preparing a sample for optical analysis

1998-03-04

2000-01-04

Breneman, Bruce

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

156345, 134 2, C03C 2506

Patent

active

060106379

ABSTRACT:
A method for preparing a sample for its optical analysis in the manufacture of a semiconductor device includes the step of drying a liquid formed on the semiconductor wafer until the concentration of contaminants contained in the liquid is of a sufficiently high level for the optical analyzer to adequately detect the contaminants. The liquid may be of a film formed on the wafer and dissolved into liquid drops, or deionized water or various chemicals to which the wafer is exposed during a manufacturing process. The apparatus includes a chuck for bringing the wafer into and out of a processing chamber, a guide for guiding the chuck, a piston cylinder for driving the chuck along the guide to a processing position, and a gas supplying system which directs nitrogen gas onto the wafer for drying the liquid. Appropriate controls are provided so that the apparatus can be operated automatically or manually.

REFERENCES:
patent: 5540821 (1996-07-01), Tepman
patent: 5686314 (1997-11-01), Miyazaki
patent: 5730801 (1998-03-01), Tepman et al.

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