Method and apparatus for precursor delivery utilizing the...

Details Method and apparatus for precursor delivery utilizing the... Method and apparatus for precursor delivery utilizing the...

2005-04-26

2005-04-26

Niebling, John F. (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S393000

Reexamination Certificate

active

06884737

ABSTRACT:
A method for providing a precursor to a supercritical processing chamber is provided. The precursor in solid form is provided in an ampoule external to the supercritical processing chamber. A fluid is provided to the ampoule, where at least a portion of the gas enters the solid precursor causing a melting point of the precursor to be depressed and thereby causing the solid precursor to melt. The melted precursor is delivered to the supercritical process chamber.

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U.S. Appl. No. 09/727,796, file date: Nov. 30, 2000.
U.S. Appl. No. 10/016,017, file date: Dec. 12, 2001.

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