Fluid handling – Processes
Patent
1997-05-12
1999-12-14
Lee, Kevin
Fluid handling
Processes
251 11, 236101R, 236 68R, F16K 5100
Patent
active
060004150
ABSTRACT:
Apparatus, positioned at an inlet port to a pump, for shielding the pump from a process chamber of a semiconductor wafer processing system, where the apparatus has a controllably variable effective throughput area, and method for electrically controlling the size of the effective throughput area. Specifically, the apparatus is a controllable restrictor shield supported by an actuator, having a first effective throughput area and a second effective throughput area, where the first effective throughput area is typically less than the second effective throughput area. The size of the effective throughput area is directly responsive to an electric signal that controls the actuator.
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Adams Bret W.
Huo David Datong
Jarvis John
Applied Materials Inc.
Lee Kevin
Motorala, Inc.
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