Method and apparatus for plasma treatment of a surface

Details Method and apparatus for plasma treatment of a surface Method and apparatus for plasma treatment of a surface

1995-04-07

1996-11-05

Breneman, R. Bruce

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118723MW, 20429838, H05H 130

Patent

active

055715770

ABSTRACT:
A radiofrequency wave apparatus and method which provides a relatively high concentration of reactive species from a plasma for the treatment of a surface particularly of a substrate (31) with a complex geometry in a holder (62) which masks a portion of the substrate. The radiofrequency waves are preferably microwaves or UHF waves. The apparatus and method is particularly useful for rapid plasma assisted chemical vapor deposition of diamond on a portion of the substrate, particularly on surfaces of objects with complex geometries such as a drill (60) or a seal ring (64).

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