Method and apparatus for plasma treatment

Details Method and apparatus for plasma treatment Method and apparatus for plasma treatment

1989-03-20

1990-01-02

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118 501, 118623, 118728, 156646, 156345, 20419232, 204298, 2041921, H01L 21306, B44C 122, C23C 1400, B05B 502

Patent

active

048910953

ABSTRACT:
A mirror field which faces a surface of a specimen to be treated and which has its field axis parallel to the specimen surface is formed in an atmosphere in a reactive gas, and a plasma of the reactive gas is then generated by introducing microwave energy into a region where the mirror field is formed, the thus-formed plasma being confined by the mirror field. The specimen is then treated by activated neutral particles which are produced by the plasma to the surface of the specimen. Preferably, an electric field is formed in the direction along the field axis of the mirror field in a region where the plasma is generated.

REFERENCES:
patent: 4776918 (1988-10-01), Otsubo et al.

Affiliated with

Also associated with

Rating

Method and apparatus for plasma treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for plasma treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for plasma treatment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1381967