Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1984-08-02
1986-01-07
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156345, 156646, 204192E, 204298, B44C 122, C03C 1500, C03C 2506, C23F 102
Patent
active
045632405
ABSTRACT:
The invention relates to a method and apparatus for a plasma process in which identical samples are processed in a plasma-processing apparatus provided with a radio-frequency plasma generation means and a microwave plasma generation means, by the utilization of a radio-frequency plasma in the radio-frequency plasma generation means and a microwave plasma in the microwave plasma generation means. The plasma-processing rate can thus be increased, and also electrical damage due to ions in the plasma can be reduced, thereby ensuring a high throughput and a high quality during the manufacture of semiconductor integrated circuit elements.
REFERENCES:
patent: 4316791 (1982-02-01), Taillet
Fukuhara Hidetomo
Marumoto Gen
Nagatomo Katsuaki
Okudaira Sadayuki
Shibata Fumio
Hitachi , Ltd.
Powell William A.
LandOfFree
Method and apparatus for plasma process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for plasma process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for plasma process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-110669